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Boron trichloride (BCL3) is a colorless fuming liquid or gas. Non-flammable, irritating, acidic odor.
Boron trichloride (BCl3) is a low vapor pressure gas. The molecule can be used in a wide range of applications, such as drying etching gases used for aluminum wiring in semiconductor and LCD manufacturing. Boron trichloride is a liquefied gas that decomposes in water into hydrogen chloride and boric acid. It is the main gas component in high-K and metal anisotropic plasma etching, atomic layer etching and pulsed plasma etching. BCL3 Gas is also mainly used for fine etching of aluminum circuits in the liquid crystal panel manufacturing process.
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Used in semiconductor manufacturing plasma etching, doping source, etc
As Organic Synthesis Catalyst in organic synthesis
for the preparation of high purity boron or organic boron
As intermediate in pharmaceutical production
Boron Trichloride is a liquified gas that decomposes in water to hydrogen chloride and boric acid. It is the main gas composition in High-K and metal anisotropic plasma etch, atomic layer etch, and pulsed plasm etch. BCL3 is also mainly used for fine etching of aluminum circuits in the manufacturing process of LCD panels.
Gaseous ammonia was first isolated by Joseph Priestley in 1774 and was termed by him “alkaline air”. Eleven years later, in 1785, Claude Louis Berthollet ascertained its composition. Boron trichloride is a starting material for the production of elemental boron. It is also used in the refining of aluminium, magnesium, zinc, and copper alloys to remove nitrides, carbides, and oxides from molten metal.
It has been used as a soldering flux for alloys of aluminium, iron, zinc, tungsten, and monel. Aluminum castings can be improved by treating the melt with boron trichloride vapors. In the manufacture of electrical resistors, a uniform and lasting adhesive carbon film can be put over a ceramic base using BCl3. It has been used in the field of high energy fuels and rocket propellants as a source of boron to raise BTU value.
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